BREAKING: China Completes First EUV Lithography Machine Prototype 🇨🇳
China has reportedly built its
first prototype extreme ultraviolet (EUV) lithography machine — a critical semiconductor tool previously monopolized by Western companies like ASML.
Key points:• The prototype was completed in
early 2025 and is now
undergoing tests at a high-security facility in Shenzhen.
• It
successfully generates EUV light, the essential step for etching the tiniest chip features — but
has not yet produced working chips.
• Development reportedly involved
former ASML engineers and the reverse-engineering of older components to build the machine.
• China aims to have
first prototype chips by 2028, though some experts say
2030 is more realistic.
• This is a notable step forward in China’s efforts to reduce reliance on foreign semiconductor technologies.
🌐📲 @TechnologyBoxs