BREAKING: China Completes First EUV Lithography Machine Prototype 🇨🇳

China has reportedly built its first prototype extreme ultraviolet (EUV) lithography machine — a critical semiconductor tool previously monopolized by Western companies like ASML.

Key points:

• The prototype was completed in early 2025 and is now undergoing tests at a high-security facility in Shenzhen.
• It successfully generates EUV light, the essential step for etching the tiniest chip features — but has not yet produced working chips.
• Development reportedly involved former ASML engineers and the reverse-engineering of older components to build the machine.
• China aims to have first prototype chips by 2028, though some experts say 2030 is more realistic.
• This is a notable step forward in China’s efforts to reduce reliance on foreign semiconductor technologies.

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