🔴 Chips are getting denser! ASML is developing “Hyper NA,” a new lithography that reduces chip density by 30%.

The successor to ASML's most advanced microchip manufacturing technology could appear in about ten years— Hyper NA EUV will replace High NA EUV. Engineers from the Dutch company and employees of Carl Zeiss, which supplies them with optics, wrote this in an article.

The new Hyper NA technology will enable the creation of chips with even smaller elements. It will leverage a significant portion of the company's existing technologies, used in the most advanced lithographic scanners using extreme ultraviolet (EUV), although some challenges remain. ASML has already begun developing this equipment, but a final decision on serial production has not yet been made. However, it is crucial for the company's prospects, as well as those of its partners and competitors.